共 10 条
[1]
APPLICATION OF GLOW-DISCHARGE MASS-SPECTROMETRY AND SPUTTERED NEUTRAL MASS-SPECTROMETRY TO MATERIALS CHARACTERIZATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1987, 5 (03)
:295-301
[2]
DANG TA, 1992, COMMUNICATION
[4]
Hofmann S., 1980, Surface and Interface Analysis, V2, P148, DOI 10.1002/sia.740020406
[5]
QUANTITATIVE DEPTH PROFILE AND BULK ANALYSIS WITH HIGH DYNAMIC-RANGE BY ELECTRON-GAS SPUTTERED NEUTRAL MASS-SPECTROMETRY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1988, 6 (04)
:2271-2279
[6]
MULLER KH, 1985, J VAC SCI TECHNOL A, V3, P1367, DOI 10.1116/1.572780
[8]
HIGH-RESOLUTION SPUTTER DEPTH PROFILING WITH A LOW-PRESSURE HF PLASMA
[J].
APPLIED PHYSICS,
1979, 20 (01)
:55-60
[9]
Wehner G.K., 1975, METHODS SURFACE ANAL, P5
[10]
PLASMA STUDIES ON THE LEYBOLD-HERAEUS INA3 SECONDARY NEUTRAL MASS-SPECTROMETRY SYSTEM
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1988, 6 (04)
:2293-2298