HYDROGEN AND HELIUM IMPLANTATION IN VITREOUS SILICA

[1] ION-IMPLANTATION EFFECTS IN NONCRYSTALLINE SIO2 [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1973, NS20 (06) : 220 - 223

[2] GLASS MACHINING BY ION SPUTTERING [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (11) : L103 - &

[3] BUBBLE FORMATION IN GLASS BY REACTION WITH SILICON AND SILICON-GERMANIUM ALLOYS [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1975, 58 (7-8) : 300 - 301

[4] INTRODUCTION RATES AND ANNEALING OF DEFECTS IN ION-IMPLANTED SIO2 LAYERS ON SI [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (12) : 5196 - 5205

[5] KAMINSKY M, 1975, WIN P AM NUCL SOC M

[6] KEEFER DR, COMMUNICATION

[7] LEVY PW, 1972, NBS348 SPEC PUBL

[8] MATTERN PL, 1974, B AM PHYS SOC, V19, P1117

[9] MATTERN PL, UNPUBLISHED

[10] MATTERN PL, 1975, B AM CERAM SOC, V54, P440

[1] ION-IMPLANTATION EFFECTS IN NONCRYSTALLINE SIO2 [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1973, NS20 (06) : 220 - 223

[2] GLASS MACHINING BY ION SPUTTERING [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (11) : L103 - &

[3] BUBBLE FORMATION IN GLASS BY REACTION WITH SILICON AND SILICON-GERMANIUM ALLOYS [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1975, 58 (7-8) : 300 - 301

[4] INTRODUCTION RATES AND ANNEALING OF DEFECTS IN ION-IMPLANTED SIO2 LAYERS ON SI [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (12) : 5196 - 5205

[5] KAMINSKY M, 1975, WIN P AM NUCL SOC M

[6] KEEFER DR, COMMUNICATION

[7] LEVY PW, 1972, NBS348 SPEC PUBL

[8] MATTERN PL, 1974, B AM PHYS SOC, V19, P1117

[9] MATTERN PL, UNPUBLISHED

[10] MATTERN PL, 1975, B AM CERAM SOC, V54, P440