TIN(IV)-BASED PHOTOSELECTIVE METAL-DEPOSITION OF COBALT AND NICKEL FROM ALKALINE BATHS

被引：24

作者：

KIFLAWI, I ^{[1
]}

SCHLESINGER, M ^{[1
]}

机构：

[1] UNIV WINDSOR,DEPT PHYS,WINDSOR N9B 3P4,ONTARIO,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 04期

关键词：

D O I：

10.1149/1.2119839

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：872 / 874

页数：3

共 8 条

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[2] LONG-LIVED SN(IV) SENSITIZER BATHS FOR PHOTO-SELECTIVE METAL-DEPOSITION [J].

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HEDGECOCK, NE ;

SCHLESINGER, M .

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[3] TIN (4) CHLORIDE SOLUTION AS A SENSITIZER IN PHOTO-SELECTIVE METAL DEPOSITION [J].

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BUSUTTIL, A ;

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SCHLESINGER, M .

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[4] NUCLEATION REACTION ON PHOTOSENSITIVE TIO2 FILMS [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (08) :1103-1107

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[6] RUTHERFORD SCATTERING STUDY OF CATALYST SYSTEMS FOR ELECTROLESS CU PLATING .2. SNCL2 SENSITIZATION AND PDCL2 ACTIVATION [J].

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