X-RAY LITHOGRAPHY

被引：14

作者：

FEDER, R ^{[1
]}

SPILLER, E ^{[1
]}

TOPALIAN, J ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

POLYMER ENGINEERING AND SCIENCE | 1977年 / 17卷 / 06期

关键词：

D O I：

10.1002/pen.760170611

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：385 / 389

页数：5

共 12 条

[1]

BASSOUS E, 1975, DEC INT EL DEV M WAS

[2]

HAGEMANN HJ, 1975, J OPT SOC AM, V65, P742, DOI 10.1364/JOSA.65.000742

[3] VARIABLE DEVELOPMENT RESPONSE OF RESISTS USING ELECTRON-BEAM LITHOGRAPHY - METHODS AND APPLICATIONS [J].

HENDERSON, RC ;

PEASE, RFW .

POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) :538-541

[4] HIGH-SPEED REPLICATION OF SUBMICRON FEATURES ON LARGE AREAS BY X-RAY LITHOGRAPHY [J].

MAYDAN, D ;

COQUIN, GA ;

MALDONADO, JR ;

SOMEKH, S ;

LOU, DY ;

TAYLOR, GN .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :429-433

[5]

MAYDAN D, 1976, 1976 DEV RES C SALT

[6] FABRICATION TECHNIQUES FOR SURFACE-ACOUSTIC-WAVE AND THIN-FILM OPTICAL DEVICES [J].

SMITH, HI .

PROCEEDINGS OF THE IEEE, 1974, 62 (10) :1361-1387

[7]

SMITH HI, 1975, IEEE T ELEC DEV, V22, P429

[8] HIGH-RESOLUTION PATTERN REPLICATION USING SOFT X-RAYS [J].

SPEARS, DL ;

SMITH, HI .

ELECTRONICS LETTERS, 1972, 8 (04) :102-&

[9]

SPEARS DL, 1972, SOLID STATE TECHNOL, V15, P21

[10]

SPILLER E, 1976, SOLID STATE TECHNOL, V19, P62

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