ENERGY ANALYSIS OF MICROWAVE ION SOURCES

被引：9

作者：

TOKIGUCHI, K

SAKUDO, N

KOIKE, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 01期

关键词：

D O I：

10.1116/1.572620

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：29 / 34

页数：6

共 20 条

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