X AND X-UV MULTILAYERED OPTICS - PRINCIPLES, FABRICATION METHODS, TESTS AND APPLICATIONS

X and X-UV artificial interferential mirrors are analogous to the dielectric multilayers prepared for the visible range, or to natural and organic crystals used in the X-ray range. Progress in evaporation methods, knowledge of the X-UV optical indices and better understanding of interferential mirror principles have lead to the possibility to optimize the fabrication of efficient X and X-UV optics based on such artificial Bragg reflectors. Specific preparation methods have been developed to obtained regular stacks having periodic ultra thin layers of two materials, convenient from the metallurgical and optical point of views. Testing methods use mainly X ray reflectivity measurements. Comparison with theoretical predictions bring insight to the interface quality and regularity of the layering. New multilayered optical devices for spectroscopy, imaging in X and X-UV are under development for plasma physics and synchrotron radiation applications. They offer completely new possibilities compared to the total reflection optics which was until to now the only way to work in X-UV.