QUANTITATIVE-DETERMINATION OF ATOMIC CONCENTRATIONS BY AUGER-ELECTRON SPECTROSCOPY

被引：13

作者：

GOLDSTEIN, Y ^{[1
]}

MANY, A ^{[1
]}

MILLO, O ^{[1
]}

WEISZ, SZ ^{[1
]}

RESTO, O ^{[1
]}

机构：

[1] UNIV PUERTO RICO,DEPT PHYS,RIO PIEDRAS,PR 00931

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.575487

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3130 / 3133

页数：4

共 13 条

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[3]

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[4]

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[5]

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[7] AN ATOMIC STANDARD TO CALIBRATE ANALYZER MODULATION IN AES [J].

SEAH, MP ;

ANTHONY, MT .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1983, 32 (01) :87-97

[8] QUANTIFICATION AND MEASUREMENT BY AUGER-ELECTRON SPECTROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

SEAH, MP .

VACUUM, 1986, 36 (7-9) :399-407

[9] DATA COMPILATIONS - THEIR USE TO IMPROVE MEASUREMENT CERTAINTY IN SURFACE-ANALYSIS BY AES AND XPS [J].

SEAH, MP .

SURFACE AND INTERFACE ANALYSIS, 1986, 9 (1-6) :85-98

[10] CHARACTERIZATION OF COMPUTER DIFFERENTIATION OF SPECTRA IN AES AND ITS RELATION TO DIFFERENTIATION BY THE MODULATION TECHNIQUE [J].

SEAH, MP ;

ANTHONY, MT ;

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JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1983, 16 (09) :848-857

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