NEW PAINT-ON DIFFUSION SOURCE

被引：8

作者：

BEYER, KD ^{[1
]}

机构：

[1] IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533

来源：

关键词：

D O I：

10.1149/1.2132636

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1556 / 1560

页数：5

共 17 条

[1]

ANDRIANOV KA, 1965, METALORGANIC POLYMER, P241

[2] DOPED OXIDES AS DIFFUSION SOURCES .I. BORON INTO SILICON [J].

BARRY, ML ;

OLOFSEN, P .

BECKER, JA .

[4]

BURZYNSKI AJ, 1969, Patent No. 3460980

[5] Monomers and polymers containing Si-O-As linkages [J].

Chamberland, Bertrand L. ;

MacDiarmid, Alan G. .

[6]

GENSER M, 1971, Patent No. 3615943

[7] RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON [J].

IRVIN, JC .

BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (02) :387-+

[8]

Irving S. M., 1968, KODAK PHOTORESIST SE, VII, P26

[9]

LONG ML, 1974, 1973 KOD MICR S INT, P38

[10]

MANGOLD DJ, 1969, APPL POLYM S, V11, P157