GROWTH OF CUBIC (100) SRTIO3 THIN-FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION USING A NOVEL TITANIUM PRECURSOR

被引：10

作者：

HOLZSCHUH, H

SUHR, H

机构：

[1] Institute of Organic Chemistry, University of Tübingen, Tübingen, W-7400

来源：

ADVANCED MATERIALS | 1992年 / 4卷 / 05期

关键词：

D O I：

10.1002/adma.19920040509

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Communication: Plasma-enhanced CVD has been used, together with a new titanium precursor (see Figure), for the deposition of epiaxed (100) SrTiO3 thin films at a growth temperature of 500-degrees-C. In technical applications (100) SrTiO3 thin films have been found to be the ideal substrate for the growth of "1-2-3-" superconductors due to the perfect lattice match. The new precursor is easy to synthesize and handle, and is stable against air and moisture.

引用

页码：357 / 359

页数：3

共 16 条

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