DOMAIN BOUNDARY CONTROL OF EDGE ROUGHNESS IN VICINAL SI(001)

被引：21

作者：

SWARTZENTRUBER, BS

MO, YW

LAGALLY, MG

机构：

[1] University of Wisconsin, Madison, WI 53706

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 08期

关键词：

D O I：

10.1063/1.104500

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Steps on vicinal Si(001) miscut toward <110> directions are known to be alternately rough and smooth. It is shown that a significant contribution to the local meandering of the rough edge, so-called "kissing sites," are nonthermodynamic. They are caused by surface antiphase domains that are created during surface cleaning.

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页码：822 / 824

页数：3

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