FABRICATION OF LARGE ARRAYS OF METALLIC NANOWIRES ON V-GROOVED SUBSTRATES

Large arrays of Au nanowires down to 50 nm in width are fabricated on V-grooved InP substrates. Holographic laser interference exposure of photoresist and anisotropic etching are used to pattern the surface of InP(001) substrates into V-shaped grooves with a 200 nm period. Next, the patterned substrates are covered with a thin Au film, which is subsequently structured into nanowires using a well controlled wet etching process. Initial characterization confirms that the wires are electrically continuous. (C) 1995 American Institute of Physics.