CHARACTERIZATION OF AN INDIVIDUAL SI THIN-LAYER BURIED IN GAAS (001) USING RAMAN-SPECTROSCOPY

被引:12
作者
TANINO, H
AMANO, S
KAWANAMI, H
MATSUHATA, H
机构
[1] Electrotechnical Laboratory, Tsukuba, Ibaraki 305
关键词
D O I
10.1063/1.349787
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a Raman scattering study of a 10-layer-thick Si film grown epitaxially on GaAs (001) and covered by GaAs. The downshift of the optical phonon mode of Si is described in terms of the planar biaxially tensile strains in the Si thin layer. The broadening to the lower-energy side is explained by the confinement effect. The layer is grown pseudomorphic on GaAs with partial lattice relaxation.
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页码:7068 / 7072
页数:5
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