X-RAY-LITHOGRAPHY USING A KRF LASER-PLASMA SOURCE

被引：20

作者：

ONEILL, F ^{[1
]}

GOWER, MC ^{[1
]}

TURCU, ICE ^{[1
]}

OWADANO, Y ^{[1
]}

机构：

[1] ELECTROTECH LAB,SAKURA,IBARAKI 305,JAPAN

来源：

APPLIED OPTICS | 1986年 / 25卷 / 04期

关键词：

D O I：

10.1364/AO.25.000464

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：464 / 465

页数：2

共 8 条

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[3] SYNCHROTRON RADIATION X-RAY-LITHOGRAPHY
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[4] KAWABUSHI, 1983, ELECTRON LETT, V19, P287
[5] LASER-PLASMA INTERACTIONS AT 0.53 MU-M FOR DISK TARGETS OF VARYING-Z
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KRUER, WL
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[J]. PHYSICAL REVIEW LETTERS, 1981, 47 (18) : 1289 - 1292
[6] MURASE K, 1977, P INT C MICROLITHOGR, P261
[7] PEARLMAN JS, 1985, P SOC PHOTO-OPT INST, V537, P102, DOI 10.1117/12.947490
[8] SUB-MICRON X-RAY-LITHOGRAPHY USING LASER-PRODUCED PLASMA AS A SOURCE
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