STRUCTURAL-PROPERTIES OF EPITAXIAL NISI2 ON SI(111) INVESTIGATED WITH X-RAY STANDING WAVES

被引：35

作者：

ZEGENHAGEN, J

HUANG, KG

GIBSON, WM

HUNT, BD

SCHOWALTER, LJ

机构：

[1] SUNY ALBANY,ALBANY,NY 12222

[2] GE,CTR RES & DEV,SCHENECTADY,NY 12301

[3] RENSSELAER POLYTECH INST,DEPT PHYS,TROY,NY 12180

来源：

PHYSICAL REVIEW B | 1989年 / 39卷 / 14期

关键词：

D O I：

10.1103/PhysRevB.39.10254

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：10254 / 10260

页数：7

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