MORPHOLOGICAL INSTABILITY OF BILAYERS OF COPPER GERMANIDE FILMS AND AMORPHOUS-GERMANIUM

被引：23

作者：

DOYLE, JP ^{[1
]}

SVENSSON, BG ^{[1
]}

JOHANSSON, S ^{[1
]}

机构：

[1] UNIV UPPSALA,DEPT TECHNOL,DIV SCI MAT,S-75121 UPPSALA,SWEDEN

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 19期

关键词：

D O I：

10.1063/1.114790

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The morphological instability of copper germanide (Cu3Ge) films in contact with amorphous germanium is reported. Through secondary ion mass spectrometry, x-ray diffraction, transmission electron microscopy, and electrical measurements, the breakdown of the continuous layer has been monitored. On the contrary, with Cu3Ge in contact with single crystal germanium, no instability is observed at the same temperature. The crystallization of the amorphous germanium appears to be the mechanism responsible for the instability. (C) 1995 American Institute of Physics.

引用

页码：2804 / 2806

页数：3

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