Texture-induced asymmetric reactions in TiN/A1-Cu/TiN

被引:8
作者
Hong, QZ [1 ]
Jeng, SP [1 ]
Havemann, RH [1 ]
Tsai, HL [1 ]
Liu, HY [1 ]
机构
[1] TEXAS INSTRUMENTS INC,MAT SCI LABS,DALLAS,TX 75243
关键词
D O I
10.1063/1.360398
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thermally induced reactions in TiN/Al-Cu/TiN have been investigated. It is observed that the amount of the reactions is different at the two interfaces between Al-Cu and TiN. While there is minimal reaction between Al-Cu and the TiN overlayer, the reaction between Al-Cu and the TiN underlayer increases the sheet resistance of Al-Cu by as much as 15%. It is further shown that the asymmetric reactions are most likely caused by the different degree of (111) texture of TiN grown on amorphous SiO2 and textured, polycrystalline Al-Cu. (C) 1995 American Institute of Physics.
引用
收藏
页码:7419 / 7421
页数:3
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