COMPARISON OF THE RETENTION CHARACTERISTICS OF LOW-ENERGY XENON AND CESIUM IMPLANTED IN SILICON

被引:31
作者
MENZEL, N
WITTMAACK, K
机构
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1981年 / 191卷 / 1-3期
关键词
D O I
10.1016/0029-554X(81)91009-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:235 / 240
页数:6
相关论文
共 20 条
  • [1] COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS
    ALMEN, O
    BRUCE, G
    [J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 257 - 278
  • [2] ALMEN O, 1961, NUCL INSTRUM METHODS, V11, P259
  • [3] Andersen CA., 1970, INT J MASS SPECTROM, V3, P413, DOI [10.1016/0020-7381(70)80001-8, DOI 10.1016/0020-7381(70)80001-8]
  • [4] DOSE DEPENDENCE OF 45 keV V + AND Bi + ION SPUTTERING YIELD OF COPPER.
    Andersen, Hans Henrik
    [J]. Radiation Effects, 1973, 19 (04): : 257 - 261
  • [5] CESIUM ION SPUTTERING OF ALUMINUM
    ANDREWS, AE
    HASSELTINE, EH
    OLSON, NT
    SMITH, HP
    [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (09) : 3344 - +
  • [6] ENERGY AND FLUENCE DEPENDENCE OF THE SPUTTERING YIELD OF SILICON BOMBARDED WITH ARGON AND XENON
    BLANK, P
    WITTMAACK, K
    [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) : 1519 - 1528
  • [7] ION SORPTION IN PRESENCE OF SPUTTERING
    CARTER, G
    COLLIGON, JS
    LECK, JH
    [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1962, 79 (508): : 299 - &
  • [8] SURFACE CESIUM CONCENTRATIONS IN CESIUM-ION-BOMBARDED ELEMENTAL AND COMPOUND TARGETS
    CHELGREN, JE
    KATZ, W
    DELINE, VR
    EVANS, CA
    BLATTNER, RJ
    WILLIAMS, P
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 324 - 327
  • [9] CHRISTODOULIDES CE, 1978, NUCL INSTR METH, V149, P225
  • [10] DENNIS JR, 1975, I PHYS C SER, V23, P467