ETCHED SHAPE CONTROL OF SINGLE-CRYSTAL SILICON IN REACTIVE ION ETCHING USING CHLORINE

被引：56

作者：

SATO, M

机构：

来源：

关键词：

D O I：

10.1149/1.2100301

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2856 / 2862

页数：7

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