AN ELLIPSOMETRIC STUDY OF OXIDE-GROWTH ON NB, AL AND NB3AL FILMS BY RF PLASMA

被引:4
作者
KATOH, Y
TANABE, K
MICHIKAMI, O
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1982年 / 21卷 / 02期
关键词
D O I
10.1143/JJAP.21.L100
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:L100 / L102
页数:3
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