ANALYTICAL STUDY OF PLATINUM SILICIDE FORMATION

[11] SPUTTERING OF PTSI AND NISI [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 345 - 349

[12] LOW-VOLTAGE TRIODE SPUTTERING WITH A CONFINED PLASMA .1. GEOMETRIC ASPECTS OF DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (02): : 519 - 527

[13] WEHNER GK, 1975, P ELECTRON MICROSCOP, P133

[14] Yakowitz H., 1975, PRACTICAL SCANNING E, P327

[11] SPUTTERING OF PTSI AND NISI [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 345 - 349

[12] LOW-VOLTAGE TRIODE SPUTTERING WITH A CONFINED PLASMA .1. GEOMETRIC ASPECTS OF DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (02): : 519 - 527

[13] WEHNER GK, 1975, P ELECTRON MICROSCOP, P133

[14] Yakowitz H., 1975, PRACTICAL SCANNING E, P327