CONTRIBUTION OF THERMAL SIO2 LAYERS ON SI WAFER BACK SURFACES TO PHOTOCONDUCTIVE DECAY TIME MEASURED WITH MICROWAVE REFLECTION FROM FRONT SURFACES

被引:5
作者
MUNAKATA, C
HONMA, N
TAMURA, H
YAGI, K
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 06期
关键词
D O I
10.1143/JJAP.28.1143
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1143 / 1144
页数:2
相关论文
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