ON THE X-RAY-ANALYSIS OF THIN SUBSURFACE LAYERS - BICRYSTAL DIFFRACTION ANALOGS

被引：15

作者：

AFANASEV, AM

FANCHENKO, SS

机构：

来源：

ACTA CRYSTALLOGRAPHICA SECTION A | 1988年 / 44卷

关键词：

D O I：

10.1107/S0108767387008158

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：25 / 33

页数：9

共 20 条

[1]

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[3] ASYMPTOTIC BRAGG-DIFFRACTION - SINGLE-CRYSTAL SURFACE-ADJOINING-LAYER STRUCTURE-ANALYSIS [J].

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[5]

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[6]

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[8] X-RAY INVESTIGATION OF LATTICE DEFORMATIONS IN SILICON INDUCED THROUGH HIGH-ENERGY ION IMPLANTATION [J].

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[9] EFFECT OF ALPHA IRRADIATION ON X-RAY DIFFRACTION PROFILES OF SILICON SINGLE CRYSTALS [J].

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[10]

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