A PROCESS SIMULATION-MODEL FOR MULTILAYER STRUCTURES INVOLVING POLYCRYSTALLINE SILICON

被引：18

作者：

MEI, L ^{[1
]}

DUTTON, RW ^{[1
]}

机构：

[1] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1982年 / 29卷 / 11期

关键词：

D O I：

10.1109/T-ED.1982.21017

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1726 / 1734

页数：9

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