AES STUDY ON THE CHEMICAL-COMPOSITION OF FERROELECTRIC BATIO3 THIN-FILMS RF SPUTTER-DEPOSITED ON SILICON

被引：33

作者：

DHARMADHIKARI, VS

GRANNEMANN, WW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571909

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

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页码：483 / 485

页数：3

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