GAP-STATE DISTRIBUTION IN GE25SE75-XBIX SPUTTERED FILMS BY PHASE-SHIFT ANALYSIS OF MODULATED PHOTOCURRENTS

被引:8
作者
KOUNAVIS, P
MYTILINEOU, E
机构
[1] Physics Department, University of Patras
关键词
D O I
10.1016/S0022-3093(05)80279-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The phase shift analysis of modulated photocurrents is used to determine the density of states of sputtered Ge25Se75-xBix films where x = 5,6,7(p-type), 10 and 13 (n-type). The increase of the Bi concentration influences differently the deep states at the valence and the conduction band tails, while E(F) seems to lie in a minimum of the DOS distribution.
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页码:955 / 958
页数:4
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