PROPERTIES OF VACANCY DEFECTS IN GAAS SINGLE-CRYSTALS

被引:283
作者
CHIANG, SY [1 ]
PEARSON, GL [1 ]
机构
[1] STANFORD ELECTR LABS,STANFORD,CA 94305
关键词
D O I
10.1063/1.321985
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2986 / 2991
页数:6
相关论文
共 20 条
[1]   VAPOR PRESSURES AND PHASE EQUILIBRIA IN GA-AS SYSTEM [J].
ARTHUR, JR .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (11) :2257-&
[2]   BEHAVIOR OF LATTICE DEFECTS IN GAAS [J].
BLANC, J ;
WEISBERG, LR ;
BUBE, RH .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1964, 25 (02) :225-&
[3]  
BLANC J, 1974, J APPL PHYS, V45, P1948, DOI 10.1063/1.1663527
[4]   HEAT TREATMENT OF GALLIUM ARSENIDE [J].
EDMOND, JT .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (08) :1428-1430
[5]   DEFECT CENTERS IN GAAS PRODUCED BY CU DIFFUSION [J].
FULLER, CS ;
WOLFSTIR.KB ;
ALLISON, HW .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (11) :4339-&
[6]   DIFFUSION + SOLUBILITY OF COPPER IN EXTRINSIC + INTRINSIC GERMANIUM SILICON + GALLIUM ARSENIDE [J].
HALL, RN ;
RACETTE, JH .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :379-&
[7]   OHMIC CONTACTS TO SOLUTION-GROWN GALLIUM ARSENIDE [J].
HARRIS, JS ;
NANNICHI, Y ;
PEARSON, GL .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) :4575-&
[9]   EFFECT OF HEAT TREATMENT ON GALLIUM ARSENIDE CRYSTALS .3. ELECTRICAL PROPERTIES OF THERMALLY CONVERTED P-TYPE CRYSTALS [J].
IKOMA, H ;
TOYAMA, M .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (04) :376-&
[10]   LUMINESCENCE IN SILICON-DOPED GAAS GROWN BY LIQUID-PHASE EPITAXY [J].
KRESSEL, H ;
DUNSE, JU ;
NELSON, H ;
HAWRYLO, FZ .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (04) :2006-&