INITIAL TRANSIENT PHENOMENA IN THE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION PROCESS

被引：21

作者：

NGUYEN, VS

PAN, PH

机构：

来源：

关键词：

D O I：

10.1063/1.95136

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：134 / 136

页数：3

共 13 条

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[7] NGUYEN VS, 1983, 163RD EL SOC M SAN F
[8] NGUYEN VS, 1983, JUN EL MAT C BURL
[9] EMISSION-SPECTROSCOPY OF GLOW-DISCHARGE AND SPUTTERING PLASMAS USED IN AMORPHOUS SI-H FILM DEPOSITION
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[10] PAN PH, 1983, 163RD EL SOC M SAN F