PLASMATRON SPUTTERING FOR THE PRODUCTION OF HIGH-STABILITY NICR RESISTIVE FILMS

被引:10
作者
SCHILLER, S [1 ]
HEISIG, U [1 ]
GOEDICKE, K [1 ]
BILZ, H [1 ]
HENNEBERGER, J [1 ]
BRODE, W [1 ]
DIETRICH, W [1 ]
机构
[1] KOMBINAT KERAM WERKE,HERMSDORF,GER DEM REP
关键词
Compendex;
D O I
10.1016/0040-6090(84)90536-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
NICKEL CHROMIUM ALLOYS
引用
收藏
页码:211 / 216
页数:6
相关论文
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