RESONANCE RAMAN-SCATTERING IN SI AT ELEVATED-TEMPERATURES

被引：118

作者：

COMPAAN, A ^{[1
]}

TRODAHL, HJ ^{[1
]}

机构：

[1] MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER

来源：

PHYSICAL REVIEW B | 1984年 / 29卷 / 02期

关键词：

D O I：

10.1103/PhysRevB.29.793

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：793 / 801

页数：9

共 23 条

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