RESPONSE OF LITHOGRAPHIC MASK STRUCTURES TO INTENSE REPETITIVELY PULSED X-RAYS - DYNAMIC-RESPONSE ANALYSIS

被引：9

作者：

DYM, CL ^{[1
]}

BALLANTYNE, A ^{[1
]}

机构：

[1] AVCO EVERETT RES LAB INC,EVERETT,MA 02149

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 12期

关键词：

D O I：

10.1063/1.336246

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4726 / 4729

页数：4

共 8 条

[1] RESPONSE OF LITHOGRAPHIC MASK STRUCTURES OF INTENSE REPETITIVELY PULSED X-RAYS - THERMAL-STRESS ANALYSIS [J].

BALLANTYNE, A ;

HYMAN, H ;

DYM, CL ;

SOUTHWORTH, R .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (12) :4717-4725

[2]

BOLEY BA, 1960, THEORY THERMAL STRES, P260

[3]

DYM CL, 1973, SOLID MECHANICS VARI

[4] PROSPECTS FOR HIGH-BRIGHTNESS X-RAY SOURCES FOR LITHOGRAPHY [J].

ECONOMOU, NP ;

FLANDERS, DC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :868-871

[5] X-RAY-LITHOGRAPHY AT - 100-A LINEWIDTHS USING X-RAY MASKS FABRICATED BY SHADOWING TECHNIQUES [J].

FLANDERS, DC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1615-1619

[6]

GROBMAN WD, 1980, IBM RC8232035136 RES

[7] INTENSE-PULSED PLASMA X-RAY SOURCES FOR LITHOGRAPHY - MASK DAMAGE EFFECTS [J].

HYMAN, HA ;

BALLANTYNE, A ;

FRIEDMAN, HW ;

REILLY, DA ;

SOUTHWORTH, RC ;

DYM, CL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (04) :1012-1016

[8]

NAGEL DJ, 1981, P SOC PHOTO-OPT INST, V279, P98, DOI 10.1117/12.965712

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