POLYCRYSTALLINE SILICON FILMS ON ALUMINUM SHEETS FOR SOLAR CELL APPLICATION

被引：37

作者：

FANG, PH

EPHRATH, L

NOWAK, WB

机构：

[1] BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167

[2] NORTHEASTERN UNIV,DEPT MECH ENGN,BOSTON,MA 02115

来源：

关键词：

D O I：

10.1063/1.1655320

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：583 / 584

页数：2

共 7 条

[1] FANG PH, 1974, NSFGI37975 REP
[2] FANG PH, 1970, P GROUND APPLICATION
[3] HANSEN M, 1958, CONSTITUTION BINARY, P132
[4] ILES P, PRIVATE COMMUNICATIO
[5] EPITAXIAL GROWTH OF SILICON AND GERMANIUM (2)
LI, CH
[J]. PHYSICA STATUS SOLIDI, 1966, 15 (02): : 419 - +
[6] CRYSTALLIZATION OF GE AND SI IN METAL-FILMS .1.
OTTAVIAN.G
SIGURD, D
MARRELLO, V
MAYER, JW
MCCALDIN, JO
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) : 1730 - 1739
[7] OTTAVIANI G, 1974, J APPL PHYS, V45, P1740