PATTERN FIDELITY IN SUB-MICRON LITHOGRAPHY WITH A RECTANGULAR ELECTRON-BEAM

被引:8
作者
OKUBO, T
TAKAMOTO, K
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1983年 / 22卷 / 08期
关键词
D O I
10.1143/JJAP.22.1335
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1335 / 1341
页数:7
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