PATTERN DEFINITION AND FORMATION ON CURVED SURFACES

被引：10

作者：

DEININGER, WD

GARNER, CE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.583992

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：337 / 340

页数：4

共 12 条

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[5]

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[6] CHEMICALLY ASSISTED ION-BEAM ETCHING OF POLYCRYSTALLINE AND (100)TUNGSTEN [J].

GARNER, C .

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[7] DIRECTED ION-BEAM SPUTTER ETCHING OF POLYTETRAFLUOROETHYLENE (TEFLON) USING AN ARGON ION-SOURCE [J].

GARNER, CE ;

GABRIEL, SB ;

KUO, YS .

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[8]

GARNER CE, 1987, MATER RES SOC S P, V75, P509

[9]

HARRIS S, 1986, COMMUNICATION 0506

[10]

JACOBSMEYER M, 1987, COMMUNICATION 1001

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