CAPTURE PROCESSES AT DOUBLE DONORS IN SILICON

被引:30
作者
KLEVERMAN, M
GRIMMEISS, HG
LITWIN, A
JANZEN, E
机构
[1] RIFA AB, DIV IC, S-16381 STOCKHOLM, SWEDEN
[2] ASEA RES & INNOVAT, OPT SENSORS, S-72183 VASTERAS, SWEDEN
关键词
D O I
10.1103/PhysRevB.31.3659
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:3659 / 3666
页数:8
相关论文
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