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PHOTOCHEMICAL VAPOR-DEPOSITION OF TITANIUMDIBORIDE

被引：10
作者：
ELDERS, J
BEBELAAR, D
VANVOORST, JDW
机构：
[1] Laboratory for Physical Chemistry, University of Amsterdam, 1018 WS Amsterdam
来源：
APPLIED SURFACE SCIENCE | 1990年 / 46卷 / 1-4期
关键词：
D O I：
10.1016/0169-4332(90)90145-P
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Titaniumdiboride (TiB2) is an attractive candidate for wear- and corrosion-resistant coatings. The photothermal deposition of TiB2 by hydrogen reduction of TiCl4 and BCl3 has been studied. In contrast to thermal chemical vapor deposition (CVD), the laser-induced chemical vapor deposition (LCVD) results in a surface reaction rate limited process. High deposition growth rates are obtained and powder production is prevented. The enhancement of the growth rate by UV light from an ArF excimer laser is larger than 40%. © 1990.
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页码：215 / 219
页数：5
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