THIN-FILM DEPOSITION TECHNIQUES UTILIZING THE ANODIC VACUUM-ARC

被引:6
作者
MEASSICK, S
CHAN, C
ALLEN, R
机构
关键词
D O I
10.1016/0257-8972(92)90186-E
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The properties of thin films produced with a steady state low current (I < 100 A) anodic arc deposition apparatus have been investigated. The anodic arc allows for the rapid deposition (faster than 5 mum min-1) of macroparticle free coatings. Coatings produced with the anodic vacuum arc are either amorphous or exhibit grains with a grain size of less than 1 nm. The resulting coatings do not have macroparticle inclusions and exhibit good adherence of the film to the substrate. Deposition results from stainless steel indicate that alloy coatings can be readily deposited with the stoichiometry of the source material being well preserved, while experiments with nickel, copper and aluminum indicate that the thin films have a very low impurity content. Investigations of the corrosion resistance of stainless steel, nickel, and aluminum coatings on iron samples indicate that coatings of less than 1.0 mum offer excellent corrosion protection.
引用
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页码:343 / 348
页数:6
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