MODELING OF LPCVD REACTORS - EFFECT OF EMPTY INLET TUBE

[1] CLAASSEN WAP, 1982, J CRYST GROWTH, V57, P29

[2] MODELING AND ANALYSIS OF LOW-PRESSURE CVD REACTORS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (09) : 1950 - 1957

[3] ANALYSIS OF MULTICOMPONENT LPCVD PROCESSES - DEPOSITION OF PURE AND INSITU DOPED POLY-SI [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (02) : 448 - 454

[4] ROSLER RS, 1977, SOLID STATE TECHNOL, V20, P63

[1] CLAASSEN WAP, 1982, J CRYST GROWTH, V57, P29

[2] MODELING AND ANALYSIS OF LOW-PRESSURE CVD REACTORS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (09) : 1950 - 1957

[3] ANALYSIS OF MULTICOMPONENT LPCVD PROCESSES - DEPOSITION OF PURE AND INSITU DOPED POLY-SI [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (02) : 448 - 454

[4] ROSLER RS, 1977, SOLID STATE TECHNOL, V20, P63