ANALYSIS OF PATTERN DIMENSION ACCURACY IN ELECTRON-BEAM LITHOGRAPHY

被引：1

作者：

SAITOU, N ^{[1
]}

OKAZAKI, S ^{[1
]}

MURAI, F ^{[1
]}

OZASA, S ^{[1
]}

KONISHI, T ^{[1
]}

机构：

[1] HITACHI LTD,NAKA WORKS,KATSUTA,IBARAKI 312,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583310

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：265 / 268

页数：4

共 7 条

[1]

CHEN CK, 1984, P SOC PHOTO-OPT INST, V471, P2, DOI 10.1117/12.942306

[2] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J].

FUJINAMI, M ;

MATSUDA, T ;

TAKAMOTO, K ;

YODA, H ;

ISHIGA, T ;

SAITOU, N ;

KOMODA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :941-945

[3] A SIMPLIFIED FOCUSING AND DEFLECTION SYSTEM WITH VERTICAL BEAM LANDING [J].

KURODA, K ;

OZASA, S ;

KOMODA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1303-1306

[4]

MATSUOKA G, 1985, SPIE J, V537, P34

[5]

MURAI F, 1983, P IEEE INT ELECTRON, P558

[6] A HIGH-SPEED, HIGH-PRECISION ELECTRON-BEAM LITHOGRAPHY SYSTEM (SYSTEM-DESIGN) [J].

NAKAMURA, K ;

SAKITANI, Y ;

KONISHI, T ;

KOMODA, T ;

SAITOU, N ;

SUGAWARA, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :94-97

[7] A HIGH-SPEED, HIGH-PRECISION ELECTRON-BEAM LITHOGRAPHY SYSTEM (ELECTRON OPTICS) [J].

SAITOU, N ;

OKUMURA, M ;

MATSUOKA, G ;

MATSUZAKA, T ;

KOMODA, T ;

SAKITANI, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :98-101

← 1 →