A SIMPLIFIED FOCUSING AND DEFLECTION SYSTEM WITH VERTICAL BEAM LANDING

[1] ASAI S, 1980, J VAC SCI TECHNOL, V16, P1710

[2] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 941 - 945

[3] Fujinami M., 1981, International Electron Devices Meeting, P566

[4] GOTO E, 1977, OPTIK, V48, P255

[5] HOSOKAWA T, 1980, OPTIK, V56, P21

[6] OPTIMIZATION OF ELECTRON-PROBE FORMING SYSTEMS WITH RESPECT TO ABERRATIONS AND VERTICAL BEAM LANDING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1686 - 1691

[7] KURODA K, 1983, OPTIK, V64, P125

[8] Munro E., 1973, IMAGE PROCESSING COM, P284

[9] OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44

[10] ADVANCED DEFLECTION CONCEPT FOR LARGE AREA, HIGH-RESOLUTION E-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1058 - 1063

[1] ASAI S, 1980, J VAC SCI TECHNOL, V16, P1710

[2] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 941 - 945

[3] Fujinami M., 1981, International Electron Devices Meeting, P566

[4] GOTO E, 1977, OPTIK, V48, P255

[5] HOSOKAWA T, 1980, OPTIK, V56, P21

[6] OPTIMIZATION OF ELECTRON-PROBE FORMING SYSTEMS WITH RESPECT TO ABERRATIONS AND VERTICAL BEAM LANDING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1686 - 1691

[7] KURODA K, 1983, OPTIK, V64, P125

[8] Munro E., 1973, IMAGE PROCESSING COM, P284

[9] OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44

[10] ADVANCED DEFLECTION CONCEPT FOR LARGE AREA, HIGH-RESOLUTION E-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1058 - 1063