共 11 条
- [1] ASAI S, 1980, J VAC SCI TECHNOL, V16, P1710
- [2] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 941 - 945
- [3] Fujinami M., 1981, International Electron Devices Meeting, P566
- [4] GOTO E, 1977, OPTIK, V48, P255
- [5] HOSOKAWA T, 1980, OPTIK, V56, P21
- [6] OPTIMIZATION OF ELECTRON-PROBE FORMING SYSTEMS WITH RESPECT TO ABERRATIONS AND VERTICAL BEAM LANDING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1686 - 1691
- [7] KURODA K, 1983, OPTIK, V64, P125
- [8] Munro E., 1973, IMAGE PROCESSING COM, P284
- [9] OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44
- [10] ADVANCED DEFLECTION CONCEPT FOR LARGE AREA, HIGH-RESOLUTION E-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1058 - 1063