OPTIMIZATION OF ELECTRON-PROBE FORMING SYSTEMS WITH RESPECT TO ABERRATIONS AND VERTICAL BEAM LANDING

被引：10

作者：

KERN, DP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570273

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1686 / 1691

页数：6

共 11 条

[1] CREWE AV, 1976, OPTIK, V46, P183
[2] Glaser W., 1952, GRUNDLAGEN ELEKTRONE
[3] GOTO E, 1977, OPTIK, V48, P255
[4] LENZ FA, 1971, ELECTRON MICROSCOPY
[5] AVERAGING OF ELECTRON-BEAM ABERRATIONS
MAUER, JL
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 853 - 856
[6] MUNRO E, 1974, OPTIK, V39, P450
[7] DESIGN AND OPTIMIZATION OF MAGNETIC LENSES AND DEFLECTION SYSTEMS FOR ELECTRON-BEAMS
MUNRO, E
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1146 - 1150
[8] DESIGN OF ELECTRON-BEAM SCANNING SYSTEMS USING MOVING OBJECTIVE LENS
OHIWA, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 849 - 852
[9] OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44
[10] DESIGN OF DEFLECTION COILS
OHIWA, H
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1977, 10 (11) : 1437 - 1449