RETENTION AND THERMAL RELEASE OF DEUTERIUM IMPLANTED IN BERYLLIUM

被引:23
作者
WAMPLER, WR
机构
[1] Sandia Natl Lab, Albuquerque, NM,, USA, Sandia Natl Lab, Albuquerque, NM, USA
关键词
FLUENCE - LIMITERS - NUCLEAR REACTION ANALYSIS - RETENTION OF DEUTERIUM - TRIM COMPUTER CODE;
D O I
10.1016/0022-3115(84)90310-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Beryllium was implanted at room temperature with deuterium at 500 and 1500 ev while the amount of D retained was measured as a function of incident fluence using nuclear reaction analysis. At low fluences almost all of the incident D is retained but at high fluences the retention saturates. The retention is well described by a saturation model using a saturation concentration of 0. 31 plus or minus . 05 D/Be and D depth profiles calculated by the TRIM code. Isochronal annealing of implanted samples shows that the D is thermally released in two stages, a broad stage at 400 plus or minus 100 degree C and a stage at 125 degree C. For samples implanted to saturation most of the D is released in the 125 degree C stage but no release occurs at this temperature for low dose implants.
引用
收藏
页码:1598 / 1602
页数:5
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