HYDROGEN DEPTH PROFILING USING SIMS - PROBLEMS AND THEIR SOLUTIONS

[1] MECHANISM OF SIMS MATRIX EFFECT [J]. APPLIED PHYSICS LETTERS, 1978, 33 (09) : 832 - 835

[2] DUSHMAN S, 1962, SCI F VACUUM TECHNIQ, P14

[3] SECONDARY ION MASS ANALYSIS - TECHNIQUE FOR 3-DIMENSIONAL CHARACTERIZATION [J]. ANALYTICAL CHEMISTRY, 1972, 44 (13) : A67 - &

[4] EVANS CA, 1980, COMMUNICATION

[5] SI(001) SURFACE STUDIES USING HIGH-ENERGY ION-SCATTERING [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 589 - 593

[6] SURFACE AND THIN-FILM ANALYSIS OF SEMICONDUCTOR-MATERIALS [J]. THIN SOLID FILMS, 1976, 31 (1-2) : 89 - 122

[7] LUNDQUIST TR, APPL SURF SCI

[8] HYDROGEN-ION IMPLANTATION PROFILES AS DETERMINED BY SIMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3): : 529 - 533

[9] DEPTH DISTRIBUTIONS OF LOW-ENERGY DEUTERIUM IMPLANTED INTO SILICON AS DETERMINED BY SIMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 383 - 387

[10] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) : 477 - 485

[1] MECHANISM OF SIMS MATRIX EFFECT [J]. APPLIED PHYSICS LETTERS, 1978, 33 (09) : 832 - 835

[2] DUSHMAN S, 1962, SCI F VACUUM TECHNIQ, P14

[3] SECONDARY ION MASS ANALYSIS - TECHNIQUE FOR 3-DIMENSIONAL CHARACTERIZATION [J]. ANALYTICAL CHEMISTRY, 1972, 44 (13) : A67 - &

[4] EVANS CA, 1980, COMMUNICATION

[5] SI(001) SURFACE STUDIES USING HIGH-ENERGY ION-SCATTERING [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 589 - 593

[6] SURFACE AND THIN-FILM ANALYSIS OF SEMICONDUCTOR-MATERIALS [J]. THIN SOLID FILMS, 1976, 31 (1-2) : 89 - 122

[7] LUNDQUIST TR, APPL SURF SCI

[8] HYDROGEN-ION IMPLANTATION PROFILES AS DETERMINED BY SIMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3): : 529 - 533

[9] DEPTH DISTRIBUTIONS OF LOW-ENERGY DEUTERIUM IMPLANTED INTO SILICON AS DETERMINED BY SIMS [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 383 - 387

[10] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) : 477 - 485