MECHANISM OF SIMS MATRIX EFFECT

[1] ION MICROPROBE MASS ANALYZER [J]. SCIENCE, 1972, 175 (4024) : 853 - +

[2] ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

[3] ADSORPTION OF GASES STUDIED BY SECONDARY ION EMISSION MASS-SPECTROMETRY [J]. SURFACE SCIENCE, 1975, 47 (01) : 324 - 343

[4] EVANS CA, 1975, ANAL CHEM, V47, P818

[5] EMISSION OF NEGATIVE IONS FROM METAL SURFACES BOMBARDED BY POSITIVE CESIUM IONS [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (12) : 3523 - &

[6] SECONDARY-ION MASS-SPECTROMETRY AND ITS USE IN DEPTH PROFILING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 385 - 391

[7] THIN-FILMS AND SOLID-PHASE REACTIONS [J]. SCIENCE, 1975, 190 (4211) : 228 - 234

[8] MAYER JW, 1974, ION BEAM SURFACE LAY

[9] SPUTTERING OF PTSI AND NISI [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 345 - 349

[10] SLODZIAN G, 1966, CR ACAD SCI B PHYS, V263, P1246

[1] ION MICROPROBE MASS ANALYZER [J]. SCIENCE, 1972, 175 (4024) : 853 - +

[2] ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

[3] ADSORPTION OF GASES STUDIED BY SECONDARY ION EMISSION MASS-SPECTROMETRY [J]. SURFACE SCIENCE, 1975, 47 (01) : 324 - 343

[4] EVANS CA, 1975, ANAL CHEM, V47, P818

[5] EMISSION OF NEGATIVE IONS FROM METAL SURFACES BOMBARDED BY POSITIVE CESIUM IONS [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (12) : 3523 - &

[6] SECONDARY-ION MASS-SPECTROMETRY AND ITS USE IN DEPTH PROFILING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 385 - 391

[7] THIN-FILMS AND SOLID-PHASE REACTIONS [J]. SCIENCE, 1975, 190 (4211) : 228 - 234

[8] MAYER JW, 1974, ION BEAM SURFACE LAY

[9] SPUTTERING OF PTSI AND NISI [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 345 - 349

[10] SLODZIAN G, 1966, CR ACAD SCI B PHYS, V263, P1246