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HOT-ELECTRONS IN MOS-TRANSISTORS - LATERAL DISTRIBUTION OF THE TRAPPED OXIDE CHARGE
被引:14
作者
:
论文数:
引用数:
h-index:
机构:
LOMBARDI, C
OLIVO, P
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOLOGNA,IST ELETTRON,I-40136 BOLOGNA,ITALY
OLIVO, P
RICCO, B
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOLOGNA,IST ELETTRON,I-40136 BOLOGNA,ITALY
RICCO, B
SANGIORGI, E
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOLOGNA,IST ELETTRON,I-40136 BOLOGNA,ITALY
SANGIORGI, E
VANZI, M
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOLOGNA,IST ELETTRON,I-40136 BOLOGNA,ITALY
VANZI, M
机构
:
[1]
UNIV BOLOGNA,IST ELETTRON,I-40136 BOLOGNA,ITALY
[2]
UNIV PADUA,INST ELETTROTECN & ELETTRON,I-35100 PADUA,ITALY
来源
:
ELECTRON DEVICE LETTERS
|
1982年
/ 3卷
/ 07期
关键词
:
D O I
:
10.1109/EDL.1982.25543
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:215 / 217
页数:3
相关论文
共 13 条
[11]
ONE-DIMENSIONAL WRITING MODEL OF N-CHANNEL FLOATING GATE IONIZATION-INJECTION MOS (FIMOS)
[J].
TANAKA, S
论文数:
0
引用数:
0
h-index:
0
TANAKA, S
;
ISHIKAWA, M
论文数:
0
引用数:
0
h-index:
0
ISHIKAWA, M
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(10)
:1190
-1197
[12]
HOT-ELECTRON DESIGN CONSIDERATIONS FOR HIGH-DENSITY RAM CHIPS
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
TROUTMAN, RR
;
HARROUN, TV
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
HARROUN, TV
;
COTTRELL, PE
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
COTTRELL, PE
;
CHAKRAVARTI, SN
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
CHAKRAVARTI, SN
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(08)
:1629
-1639
[13]
Wada M., 1981, International Electron Devices Meeting, P223
←
1
2
→
共 13 条
[11]
ONE-DIMENSIONAL WRITING MODEL OF N-CHANNEL FLOATING GATE IONIZATION-INJECTION MOS (FIMOS)
[J].
TANAKA, S
论文数:
0
引用数:
0
h-index:
0
TANAKA, S
;
ISHIKAWA, M
论文数:
0
引用数:
0
h-index:
0
ISHIKAWA, M
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(10)
:1190
-1197
[12]
HOT-ELECTRON DESIGN CONSIDERATIONS FOR HIGH-DENSITY RAM CHIPS
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
TROUTMAN, RR
;
HARROUN, TV
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
HARROUN, TV
;
COTTRELL, PE
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
COTTRELL, PE
;
CHAKRAVARTI, SN
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,TROY,NY 12181
RENSSELAER POLYTECH INST,TROY,NY 12181
CHAKRAVARTI, SN
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(08)
:1629
-1639
[13]
Wada M., 1981, International Electron Devices Meeting, P223
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1
2
→