HOT-ELECTRONS IN MOS-TRANSISTORS - LATERAL DISTRIBUTION OF THE TRAPPED OXIDE CHARGE

被引:14
作者
LOMBARDI, C
OLIVO, P
RICCO, B
SANGIORGI, E
VANZI, M
机构
[1] UNIV BOLOGNA,IST ELETTRON,I-40136 BOLOGNA,ITALY
[2] UNIV PADUA,INST ELETTROTECN & ELETTRON,I-35100 PADUA,ITALY
来源
ELECTRON DEVICE LETTERS | 1982年 / 3卷 / 07期
关键词
D O I
10.1109/EDL.1982.25543
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:215 / 217
页数:3
相关论文
共 13 条
[11]   ONE-DIMENSIONAL WRITING MODEL OF N-CHANNEL FLOATING GATE IONIZATION-INJECTION MOS (FIMOS) [J].
TANAKA, S ;
ISHIKAWA, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (10) :1190-1197
[12]   HOT-ELECTRON DESIGN CONSIDERATIONS FOR HIGH-DENSITY RAM CHIPS [J].
TROUTMAN, RR ;
HARROUN, TV ;
COTTRELL, PE ;
CHAKRAVARTI, SN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) :1629-1639
[13]  
Wada M., 1981, International Electron Devices Meeting, P223