THIN-FILM STUDIES OF OXIDES BY THE ORGANOMETALLIC-CVD TECHNIQUE

被引：24

作者：

PRAKASH, H ^{[1
]}

机构：

[1] NATL CHEM LAB, DIV INORGAN CHEM, POONA 411008, MAHARASHTRA, INDIA

来源：

PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS | 1983年 / 6卷 / 04期

关键词：

D O I：

10.1016/0146-3535(83)90014-X

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：371 / 391

页数：21

共 75 条

[1] *LA DETERMINATION DE LINDICE ET DE LEPAISSEUR DES COUCHES MINCES TRANSPARENTES [J].

ABELES, F .

JOURNAL DE PHYSIQUE ET LE RADIUM, 1950, 11 (07) :310-314

[2]

ABELES F, 1958, J PHYS-PARIS, V19, P327

[3] DEPOSITION AND PROPERTIES OF ALUMINUM OXIDE OBTAINED BY PYROLYTIC DECOMPOSITION OF AN ALUMINUM ALKOXIDE [J].

ABOAF, JA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) :948-&

[4]

[Anonymous], 1953, VACUUM, DOI DOI 10.1016/0042-207X(53)90411-4

[5] TIN OXIDE THIN FILM TRANSISTORS [J].

AOKI, A ;

SASAKURA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (05) :582-&

[6] PREPARATION AND PROPERTIES OF TIN OXIDE-FILMS FORMED BY OXIDATION OF TETRAMETHYLTIN [J].

BALIGA, BJ ;

GHANDHI, SK .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (06) :941-944

[7] THIN-FILMS OF METAL-OXIDES ON SILICON BY CHEMICAL VAPOR-DEPOSITION WITH ORGANOMETALLIC COMPOUNDS .1. [J].

BALOG, M ;

SCHIEBER, M ;

MICHMAN, M ;

PATAI, S .

JOURNAL OF CRYSTAL GROWTH, 1972, 17 (DEC) :298-&

[8] CHARACTERISTICS OF GROWTH OF FILMS OF ZIRCONIUM AND HAFNIUM OXIDES (ZRO2, HFO2) BY THERMAL-DECOMPOSITION OF ZIRCONIUM AND HAFNIUM BETA-DIKETONATE COMPLEXES IN THE PRESENCE AND ABSENCE OF OXYGEN [J].

BALOG, M ;

SCHIEBER, M ;

MICHMAN, M ;

PATAI, S .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (07) :1203-1207

[9]

BALOG M, 1977, THIN SOLID FILMS, V41, P247, DOI 10.1016/0040-6090(77)90312-1

[10] CHEMICAL VAPOR-DEPOSITION AND CHARACTERIZATION OF ZRO2 FILMS FROM ORGANOMETALLIC COMPOUNDS [J].

BALOG, M ;

SCHIEBER, M ;

MICHMAN, M ;

PATAI, S .

THIN SOLID FILMS, 1977, 47 (02) :109-120

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