LOW-PRESSURE RF DISCHARGE IN ELECTRONEGATIVE GASES FOR PLASMA PROCESSING

被引：25

作者：

FEOKTISTOV, VA

LOPAEV, DV

KLOPOVSKY, KS

POPOV, AM

POPOVICHEVA, OB

RAKHIMOV, AT

RAKHIMOVA, TV

机构：

[1] Microelectronics Center, Institute of Nuclear Physics, Moscow State University, Moscow

来源：

JOURNAL OF NUCLEAR MATERIALS | 1993年 / 200卷 / 03期

关键词：

Electric discharges;

D O I：

10.1016/0022-3115(93)90301-E

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An RF plasma discharge in oxygen has been investigated both experimentally and theoretically. The excited species in the oxygen plasma were detected by means of spontaneous luminescence spectroscopy. A self-consistent numerical model was developed for these discharges. The model was confirmed by several theoretical and experimental investigations. The spatial distribution over the discharge gap of both charged and neutral plasma components and their fluxes to electrodes have been calculated.

引用

页码：309 / 314

页数：6

共 12 条

[1]

ABISHEV AB, 1990, FIZ PLAZMY, V16, P844

[2]

BOBORVSKY VV, 1988, FIAN N206 PREPR

[3] NUMERICAL-MODEL OF RF GLOW-DISCHARGES [J].