FIELD-ION MICROSCOPE AND ATOM-PROBE ANALYSIS OF NI OVERLAYERS ON THIN-FILMS OF RH2O3

The structure and composition of Ni overlayers on thin films of Rh2O3 have been investigated with the techniques of field ion microscopy and atom-probe mass spectroscopy. The metal-oxide-metal structures were produced by thermal oxidation of Rh field emitters in 1 Torr O2 at 500 K and subsequent deposition of Ni at approximately 100 K. The as-deposited Ni films were found to have a fine-grained polycrystalline structure and the Ni-Rh2O3 interface was atomically sharp. A small amount of interdiffusion between the Ni and Rh2O3 oxide was detected upon annealing the structures to 300 K. Interdiffusion was extensive upon annealing to 500 K.