FORMATION AND SCHOTTKY BEHAVIOR OF MANGANESE SILICIDES ON NORMAL-TYPE SILICON

被引：90

作者：

EIZENBERG, M ^{[1
]}

TU, KN ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1063/1.330029

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6885 / 6890

页数：6

共 26 条

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