ROLE OF METAL-SEMICONDUCTOR INTERFACE IN SILICON INTEGRATED-CIRCUIT TECHNOLOGY

被引：72

作者：

ANDREWS, JM ^{[1
]}

机构：

[1] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.1318716

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：972 / 984

页数：13

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