ROLE OF METAL-SEMICONDUCTOR INTERFACE IN SILICON INTEGRATED-CIRCUIT TECHNOLOGY

被引:72
作者
ANDREWS, JM [1 ]
机构
[1] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 06期
关键词
D O I
10.1116/1.1318716
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:972 / 984
页数:13
相关论文
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